谢谢您!作者: baggio2222 时间: 2008-4-16 14:55
SPIE
Recent Developments in the Measurement of Aspheric Surfaces by Contact Stylus Instrumentation baggio2232@sina.com
急!!!谢谢您作者: beiyangkl 时间: 2008-4-21 16:01
谢谢!
R. Brunner, R. Steiner, K. Rudolf, and H.-J. Dobschal,
Diffractive-Refractive Hybrid
Microscope Objective for 193 nm Inspection Systems; Proc. SPIE Vol. 5177 (2003)9–15
R. Brunner, A. Menck, R. Steiner, G. Buchda, S. Weissenberg, U. Horn, and
A.M. Zibold, Immersion Mask Inspection with Hybrid-Microscopic Systems at 193 nm;
Proc. SPIE Vol. 5567 (2004) 887–893
T. Sure, J. Heil, and J. Wesner, Microscope objective production: On the
way
from the micrometer scale to the nanometer scale, Proc. SPIE Vol. 5180 (2003)283–292