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Evaporation Guide Acrobat 3.0 file size 181KB
This guide was prepared by Edward Graper of Lebow Corporation, and is being made available to assist Telemark customers. In the preparation of this guide, every effort has been made to ensure accuracy, completeness and clarity. Unfortunately, in a work of this scope, errors are inevitable. Neither Edward Graper nor Lebow Corporation nor Telemark warranties the accuracy of this information or the results of its applications. Use this information, at your own risk, as a general guide. Use an independent check for important data. This guide may not be reproduced in any way without written permission from Lebow Corporation, which will generally be granted.
Choosing a Chamber
During the past 15 to 25 years, the equipment used to deposit optical thin film coatings has changed dramatically. This guide will explain how to pick the best chamber based on needed functions.
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Ion Bombardment Characteristics During Growth of Optical Films Using a Cold Cathode Ion Source
In the present work, the energy and flux of impinging ions are evaluated in the context of ion-assisted deposition of optical films and ion-induced modification of polymer surfaces for improved adhesion. The experiments were performed in a vacuum system equipped with a broad beam cold cathode ion source.
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Bipolar Pulsed DC Sputtering of Optical Films
Bipolar pulsed DC sputtering is a new technique for high rate reactive deposition of dielectric oxides on diverse types of substrates. This effort reports on the application of Bipolar pulsed DC sputtering to generate single layer and multilayer oxide coatings on flat, curved, glass and plastic substrate surfaces. The optical (refractive index and extinction coefficient) and physical (durability and moisture stability) properties of Ta2O5 TiO2, ZrO2, Nb2O5, WO3, Al2O3 and SiO2 films and film stacks are presented.
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Ion-Assisted Deposition of E-Gun Evaporated ITO Films at Low Substrate Temperatures
ITO films have traditionally been deposited by sputtering on low temperature substrates and by evaporation on substrates heated to high temperatures. Recent work in our Application Laboratory using ion assisted deposition (IAD) at low substrate temperatures with a broad beam cold cathode ion source has resulted in ITO film properties comparable to non-IAD high temperature evaporation. This work reports the electrical and optical properties for ITO films deposited over a broad parameter space.
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Stability and Repeatability of 2-Layer Anti-Reflection Coatings
The manufacture of a simple anti-reflection (AR) coating design can often prove to be more difficult than anticipated. By changing to a different material system, we were able to use a different 2-layer design which is much less sensitive to these process variations and which improved the yield to 100%. The theoretical basis for this reduced sensitivity is given, together with confirming experimental results.
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Thickness Distribution of Evaporated Films
The emission distribution characteristics of an evaporation source can be used to define the correct geometry in the vacuum chamber for the production of uniform-thickness coatings.
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Dense Moisture Stable Titania and Silica Ion Assisted Deposited Films Deposited Using a Compact Cold Cathode Ion Source.
The cold cathode ion source is a relatively mature device but has generally been regarded as having limited utility in applications requiring large area, uniform ion beams or improving the oxidation of reactive processes and increasing the refractive index of deposited films.
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Measurement and Correlation of Ion Beam Current Density to Moisture Stability of Oxide Film Stacks Fabricated by Cold Cathode Ion Assisted Deposition.
Cold cathode ion sources, which are capable of continuous operation with 100% oxygen, have traditionally been used in a high current/low energy mode to assist in the fabrication of low absorption, high index oxide films. This work reports on the use of the cold cathode ion source at high energy levels to generate moisture stable thin film optical stacks.
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Optimizing Source Location For Control of Thickness Uniformity
For a substrate rack in single rotation it is theoretically possible to achieve perfect thickness uniformity simply by developing the correct mask profile for the emission characteristic of the evaporation source.
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Why Ion Assisted Deposition (IAD)?
The use of energetic ions and radicals are preconditions to achieve films of good quality with reactive coating processes at room temperature and both also help to broaden the accessible parameter range in case of processes at elevated temperatures.
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Characterization of a Plasma Ion Source and of Ion Assisted Deposited Optical Thin Films
It is well known that IAD (ion assisted deposition) using a plasma source improves the optical and physical characteristics of optical thin films. There are many types of plasma sources. The broad beam CC-105 "cold cathode" plasma source is a small versatile ion source that is easily retrofitted into existing deposition chambers or new installations. This paper discusses characterization of the ion produced by the plasma source and the properties of thin films produced using the plasma source for IAD (ion assisted deposition).
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X-1 Silver: A High Durability Silver Coating for use in Harsh Environments
Silver reflective coatings are attractive in optical systems because of their intrinsic high reflectance over a broad spectral range. Their use has been limited due to their tendency to tarnish when exposed to harsh operating environments. Denton has developmed a silver coating with greatly increased durability as measured by its resistance to attack by salt fog and other standard environmental tests.
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The Effects of Pumping Speed on the Operation of a Cold Cathode Ion Source
A cold cathode ion source is a differentially pumped device with one end of the plasma chamber open to the vacuum environment of the coating system. Therefore, the operational parameters of the ion source and the quality of the films made using the ion source are affected by the parameters controlling the vacuum level. These include the pumping speed of the chamber, any leaks that may be present and the controlled flow of any gases into the chamber. The pumping speed of the chambers is the major factor not directly controllable that affects the quality of the films that can be made using the ion source. In this study we will present data on the operational parameters of a cold cathode ion source at different pumping speeds and the subsequent effect on the optical properties of TiO2 films.
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偶然看到的就贴上来了。
老兄，同样的帖子干嘛发两次啊，而且上面东西很难下载呀
You can visit www.dentonvacuum.com
thks WeiHua!
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