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项次 设备类别 ECCN 对应之货品号列(C.C.C) 货品名称 1 供半导体晶圆铜导线用之化学机械研磨机 Chemical machanical polisher(CMP) (WA未列管) 8464.20.10.00-7 供半导体晶圆制程用之磨光、拋光及研磨机器Grinding, polishing and lapping machines for processing of semiconductor wafers 2 供半导体晶圆制造用之光阻剥除机Photo-resist stripper (WA未列管) 8456.99.30.00-9 去除光阻物或清洗半导体晶圆之器具Apparatus for stripping or cleaning semiconductor wafers 3 供半导体晶圆制造用之光阻显影机Photo-resist developer 3.B.1.f 8479.89.83.00-0 供湿蚀刻、显影、去除光阻物或清洗半导体晶圆及平板显示器之器具Apparatus for wet etching, developing, stripping or cleaning semiconductor wafers and flat panel displays 4 供半导体晶圆制造用之快速高温热处理机Rapid thermal processor(RTP) 3.B.1.a 8514.30.10.00-5 半导体晶圆快速加热器具Apparatus for rapid heating of semiconductor wafers 5 供半导体晶圆制造用之沉积设备Deposition apparatus 1.B.1.d, 2.B.5.a, 3.B.1.a, 3.B.1.d, 3.B.1.e 8419.89.60.00-0 生产半导体用化学蒸着沉积器具Chemical vapor deposition apparatus for semiconductor production 8479.89.82.00-1 供溅镀半导体晶圆产生物理气相沉积之器具Apparatus for physical deposition by sputtering on semiconductor wafers 8479.89.86.00-7 半导体晶圆叠晶沉积机Epitaxial deposition machines for semiconductor wafers 8479.89.88.00-5 制造半导体用之物理气相沉积器具Physical deposition apparatus for semiconductor production 8479.89.91.00-0 生产半导体用化学蒸着沉积器具,非属第8419.89目者Chemical vapor deposition apparatus for semiconductor production other than articles of subheading No. 8419. 89 6 供半导体晶圆制造用之洗净设备Cleaning equipment (WA未列管) 8424.89.22.00-0 供蚀刻、去除光阻物或清洗半导体晶圆之喷洒机具Spraying appliances for etching, stripping or cleaning semiconductor wafers 7 供半导体晶圆制造用之干燥机 Dryer (WA未列管) 8421.19.10.00-2 半导体晶圆加工用旋转干燥机Spin dryers for semiconductor wafer processing 8479.89.89.00-4 供感光乳剂涂附在半导体晶圆上之旋转器Spinners for coating photographic emulsions on semiconductor wafers 8 供半导体晶圆制造用之电子显微镜Electron microscopes 3.B.1.f 9011.20.10.00-3 附有专供半导体晶圆或网线上下料及传送设备用之显微照相显微镜Photomicrographic microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles 9012.10.10.00-4 附有专供半导体晶圆或网线上下料及传送设备用之电子束显微镜Electron beam microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or retices 9 供半导体晶圆制造用之蚀刻机Etcher 3.B.1.c, 3.B.1.e 8456.91.00.00-3 供半导体材料干式蚀刻图形用工具机Machine-tools for dry-etching patterns on semiconductor materials 8543.30.10.00-0 供湿蚀刻、显影、去除光阻物或清洗半导体晶圆及平板显示器之器具Apparatus for wet etching, developing, stripping or cleaning semiconductor wafers and flat panel displays 10 供半导体晶圆制造用之离子植入机Ion implanter 3.B.1.b 8543.11.00.00-5 供掺杂半导体材料之离子植入器 Ion implanters for doping semiconductor materials 11 供半导体晶圆制造用之光阻涂布机Photo-resist coater 3.B.1.f 8479.89.99.30-6 制造半导体晶圆用之光阻涂布器具 Photo-resist coaters for semiconductor wafers 12 供半导体晶圆制造用之微影设备 lithography equipment 3.B.1.f 9010.42.00.10-8 生产半导体晶圆用之步进对准机 Steppers for semiconductor wafers 9010.42.00.20-6 生产半导体晶圆用之扫描对准机Scanners for semiconductor wafers 8456.99.20.10-9 半导体制程中,供制造光罩及网线之电子束直写机E-beam writers to produce masks and reticles for patterns on semiconductor devices |