[转帖]离子束辅助镀膜

请教离子束辅助镀膜的原理？

e-beam assistant deposition is a method, e-beam bombards the taget, which makes the taget evaporating high energy particles,it will induce deposition film more stable. while plasma generates by electric field or magenetic field. e-beam and plasma are two different methods. i think so.

离子束轰击表面，可以增加基底的表面能，从而改善膜的结构（更致密），提高附着力；根据所用离子的不同，还可已改善膜的成份。总之好处多多。

sorry, i just make a mistake, iron assisted deposition, not e-beam, irom beam (it also could be called plasma), Mr fulong927's explain is very good

没有离子源镀膜时，由于分子能量较底，当分子接触到基板时失去能量，并阻挡后面分子的前进。从而形成柱状结构。膜层中会有大量间隙存在，在高温或高湿下光谱会偏移。

有离子源镀膜时，高能离子携带分子，轰击表面，从而改善膜的结构（更致密），提高附着力，提高光谱稳定性。

谢谢!!!!!