参数：
Specifications
Operating wavelength 190 - 400 nm
Phase mask period 0.4 - 1.2 μm
Period manufacturing ±0.3 nm for unchirped masks
tolerance (±0.1 nm optional)
Period measurement accuracy ± 0.02 nm
Dimensions Substrate size / Aperture
17.2 x 24.5 mm / 10 x 20 mm
17.2 x 38.1 mm / 10 x 34 mm
17.2 x 50.8 mm / 10 x 45 mm
Custom sizes optional
Chirp range (for chirped masks)0.03 nm/cm - 40 nm/cm
Damage threshold Better than 1 J/cm2 per pulse at 50 Hz @ 248 nm
Diffraction £ 3 % in 0th order; 33 % in ± 1st order
efficiency £ 1.0 % in 0th order; 35 % in ± 1st order
(optional) for periods between 0.66 and 1.2mm
Material Corning 7980, Suprasil
Substrate flatness l @ 248 nm, both sides
Scratch and dig 20 - 10
AR coating Optional
Wedge < 30 arcsec
Thickness 3.175 mm ± 0.125 mm
For chirped masks: center period precision: ± 0.5 nm with ± 200 μm center positioning error.
参数：
Specifications
Operating wavelength 190 - 400 nm
Phase mask period 0.6 - 1.2 μm
Period manufacturing tolerance ±0.3 nm for unchirped masks (±0.1 nm optional)
Period measurement accuracy ± 0.02 nm
Dimensions Substrate size / Aperture
17.2 x 127.0 mm / 10 x 120 mm
17.2 x 152.4 mm / 10 x 140 mm
Chirp range (for chirped masks) 0.03 nm/cm - 30 nm/cm
Diffraction efficiency £ 5 % in 0th order; 30 % in ± 1st order
Damage threshold Better than 1 J/cm2 per pulse at 50 Hz @ 248 nm
Material Corning 7980, Suprasil
Substrate flatness l @ 248 nm, both sides
Scratch and dig 20 - 10
AR coating Optional
Wedge < 30 arcsec
Thickness 3.175 mm ± 0.125 mm
For chirped masks: center period precision: ± 0.5 nm with ± 200 μm center positioning error.
（注：上图所述样式仅供参考，具体可定制样式多样化）
参数：
Substrate Material Fused silica
Substrate Thickness 3.175 mm, 10.0 mm (other dimensions available upon request)
Period of any single active grating area 300 nm to 1200 nm
Standard Substrate Dimensions 3" x 3", 4" x 4", 5" x 5"
