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微晶玻璃试片的化学抛光研究
A Chemical Method to Polish Glass-Ceramic Slice
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作 者:汤英童 袁顺山 熊长新
TANG Ying-tong ,YUAN Shun-shan ,XIONG Chang-xin ( Huazhong Institute of Electro-Optics--Wuhan National Laboratory for Optoelectronics, Wuhan 430223, China )
机构地区:华中光电技术研究所一武汉光电国家实验室,湖北武汉430223
出 处:《光学与光电技术》 2014年第12卷第3期 48-52页,共5页
optics&optoelectronic technology
摘 要:光学零件的凹槽、孔道等复杂结构无法进行机械抛光,只能采用化学抛光。分析了化学抛光的机理和微晶玻璃的组成,设计了化学抛光技术方案、工艺流程和操作方法。对微晶玻璃化学抛光前后的光学表面进行了测试、分析。结果表明:化学抛光去除量主要由化学抛光液的温度和抛光时间控制。采用氟化氢铵、氢氟酸与添加剂组成的化学抛光液和合适的化学抛光工艺,可以能够得到光滑、透明的表面,表面粗糙度可降低到100nm;可见光透过率81%~83%。
A method is proposed to solve the problem of polishing the grooves and channels of optical parts. Both chemical polishing mechanism and glass-ceramic composition and are analyzed. Meanwhile, the technical solution, work flow and op- eration method are given. The result shows that the chemical polishing removal of the volume can be controlled mostly by temperature of chemical polishing solution and polishing time. The surface roughness and transmittance of glass-ceramic slice, polished by the mixed solution of NH4 HF2, HF and additive, can reach 100 nm and 81--83% respectively.
关键词:微晶玻璃 化学抛光 光学加工 控制
glass ceramics ; chemical polishing ; optical proeessing ; control ; |
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