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纳米级面形精度光学平面镜加工
Fabrication of optical flat mirror with nanometer surface error
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作 者:张峰
ZHANG Feng (Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China)
机构地区:中国科学院长春光学精密机械与物理研究所光学系统先进制造技术中国科学院重点实验室,吉林长春130033
出 处:《中国光学》 2014年第7卷第4期 616-621页,共6页
Chinese Optics and Applied Optics Abstracts
基 金:国家自然科学基金资助项目(No.61210015)
摘 要:为实现纳米级面形精度光学平面镜的高效精密抛光,提出了一种由传统环带抛光技术和先进离子束抛光技术相结合的组合式加工方法。介绍了环带抛光技术和离子束抛光技术的原理,通过实验研究了离子束抛光的材料去除函数,并采用这种组合抛光方法对口径为150 mm的平面镜进行抛光,抛光后平面镜的面形误差和表面粗糙度分别达到1.217 nm RMS和0.506 nm RMS。实验结果表明,这种组合抛光技术适合纳米级面形精度光学平面镜的加工。
In order to polish optical flat mirror with nanometer surface error efficiently , a consisting of new polishing technology traditional continuous polishing ( CP) and advanced ion beam figuring ( IBF) is presented in this paper .The polishing principles of CP and IBF are introduced .The polishing experiment and material removal function of IBF are studied .A Ф150 mm optical flat mirror is polished by the combined polishing technology .After polishing , the surface error and roughness of the flat mirror are 1.217 nm RMS and 0.506 nm RMS, respectively .The experiment results indicate that the combined polishing technology is effec-tive for polishing optical flat mirror with nanometer surface error .
关键词:光学加工 环带抛光 离子束抛光 材料去除函数
optical fabrication ; continuous polishing(CP) ; ion beam figuring(IBF) ; material removal function ; |
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