磁流变抛光液的配制及其抛光稳定性

风轻扬 · 发表于 2015-7-12 17:32:34

磁流变抛光液的配制及其抛光稳定性
Preparation of Magnetorheological Polishing Fluid and Its Polishing Stability
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作　　者：白杨[1,2] 张峰[1] 邓伟杰[1] 李龙响[1,2] 郑立功[1] 张学军[1]
Bai Yang Zhang Feng Deng Weijie Li Longxiang Zheng Ligong Zhang Xuejun （1 Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Science Changchun, Jilin 130033, China 2 University of Chinese Academy of Sciences, Beijing 100049, China）
机构地区：[1]中科院长春光学精密机械与物理研究所,吉林长春130033 [2]中国科学院大学,北京100049
出　　处：《光学学报》 EI CSCD 2014年第4期 175-182页,共8页
Acta Optica Sinica
基　　金：国家973计划（2011CB0132005）、国家自然科学基金（61036015）
摘　　要：磁流变液是一种分散体系，通过对分散体系稳定性的研究，并结合磁流变抛光的实际需求，确定了磁流变抛光液添加组分，配制出了适合于光学加工的水基磁流变抛光液。所配制的磁流变液初始粘度仅为0.2 Pa·s，利用磁流变仪检测所配制磁流变液在剪切率为1 s^-1，磁场强度为0.35 T时，剪切应力达42.5 kPa。利用所配制的磁流变抛光液分别对K9玻璃和Si材料进行抛光，经过2 h持续抛光，K9玻璃和Si材料去除函数的峰值去除量相对变化率分别为0.15%和0.22%，体积去除量相对变化率分别为1%和0.88%，去除函数的峰值去除率分别达到4.83 μm/min和1.376 μm/min。结果验证了所配制的抛光液具有极好的稳定性以及较高的去除效率，能够保证抛光材料的快速去除和高效收敛。
Magnetorheological（MR） fluids are a kind of dispersion system. Through the study on the stability of dispersed system and the actual needs of magnetorheological finishing （MRF）, the components of a water-based MR polishing fluids are determined, which are suitable for optical manufacturing in this paper. The initial viscosity of the MR polishing fluids is only 0.2 Pa·s. The yield shear stress of this MR fluid is 42.5 kPa via magnetic rheometer test under the shear rate of 1 s-1 and magnetic field intensity of 0.35 T. Polishing experiments are carried out on K9 glass and silicon with the MR polishing fluids. The experimental results show that the relative changes of removal function peak removal rate are 0.15% and 0.22%, and volume removal rate are 1% and 0.88% for K9 glass and silicon respectively in 2 h continuous polishing. The peak removal rate of removal function reaches 4.83 μm/min for K9 glass and 1.376 μm/min for silicon. The results prove that the MR polishing fluids has a good stability and high removal efficiency which ensure that the polished material will be fast removed and has convergent efficiently by MRF.
关键词：材料光学加工磁流变抛光液分散机理去除函数材料去除效率稳定性
materials ; optical machining ; magnetorheological polishing fluid ; dispersion mechanism ; removalfunction ; material removal efficiency ; stability ;

[技术] 磁流变抛光液的配制及其抛光稳定性

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