初级菜鸟请教大侠们一个问题

真空度在几Pa就应该可以了。

下面引用由lavajydm在 2003/11/08 10:50pm 发表的内容：
好久没来了！我先顶一下！兄弟要多多的看书啊！薄膜科学与技术手册 很好的！你去借！很专业的书籍！

不错，好多教材或资料上都有说到的。找本镀膜书看一看啊，上面有很多这方面的东东。

PECVD is Plasma Enhenced CVD Deposition method. So this method is quite different from E-Beam deposition system. If you deposit materials like SiO2, the vacuum is not enough, but if can not reach even high vacuum, 5E-1Pa is ok la. Remember: the depostion pressure in chamber is about several tens mT or even more than one hundred mT.

1 atm=750T=750000mT=1E+5Pa

PECVD可以做低压或常压的，我以前做的就是一个机械泵，还没用扩散泵呢。