VUV-VASE from J.A. Woollam (Lincoln, Neb.) is a vacuum ultraviolet variable angle spectroscopic ellipsometer for determining the optical properties of films from 145 to 1700 nm. It has been used in the characterization of 157 nm-based lithography processes, and has the flexibility to measure the composition and thickness of oxynitride and perovskite gate materials, as well as high-bandgap semiconductor materials