LD前工艺中的ECR

小弟正在做ecr，就是电子回旋共振。

该仪器公司有说明如下：The system is designed to permit surface processing by an ECR generated plasma of up to quantity three, 2" diameter, or a single 5" wafer subject to temperature control and RF bias. Vacuum pressure in the main chamber is capable of reaching pressures less than 1x10-10m.bar with turbo-molecular pumping plus optional titanium sublimation pumping. Vacuum ports are available for diagnostic and gas introduction.

The system is installed as shown on a support table with 19" electrical rack and one power distribution panel. The electrical system will require extra power with customer supplied breakefor the ECR source to supply the 1 kW 208 VAC 1 phase, 15 Amp microwave source and two magnets requiring 208 VAC 3 phase, 20 Amp and 208 VAC 3 phase, 15 Amp. Vacuum integrity via a leak test to 2x10-10 Torr 1/sec He, along with sample transfer and heating, will be demonstrated.

不知各位大虾可有用过，若有，指点一二，不尽感激。