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Iterative design of masks for VLSI production
To meet the continuing demand for increased computing power, the dimensions of devices on integrated circuits need to decrease. This presents difficulties for the optical systems used to write the integrated circuit patterns when the sizes of the devices are of the same order of size as the wavelength of the light being used. The standard way of producing a circuit is that a number (20 to 30 being typical) of optical masks (usually chrome on glass) are produced each corresponding to one stage of the lithography process. These masks are used to illuminate and expose photo-resist layers on the circuit. The problem with current optical masks is that the wavelength of the light imposes a limit on the size of the patterns that can be produced.

One method that has been proposed to enable opical masks to produce smaller features is is to use optical masks that affect not only the intensity of the light but also its phase. This project will investigate methods for the design of these masks and explore novel mask arrangements such as masks in out of focus positions to assist in enhancing the prformance of this important technology.

The project will involve theoretical modelling, computer-based simulations and experimental lab-based optical work,.
我本科是学电气自动化的,所以对光电是外行,想带些中文书过去,大家给点建议吧,多谢了